Excimer Laser Surface Patterning for Photoluminescence Enhancement of Silicon Nanocrystals
نویسندگان
چکیده
A method for enhancing the photoluminescence of silicon nanocrystals in a oxide matrix by fabrication periodic surface structures through laser irradiation is demonstrated. ArF excimer lasers are used to produce line material ablation. Photoluminescence, Raman, and transmission electron microscope measurements consistently show formation crystalline after high-temperature annealing. 2.6-fold enhancement signal measured structure with 600 nm period. The influence on from layer discussed terms simple model describing main effect.
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ژورنال
عنوان ژورنال: Photonics
سال: 2023
ISSN: ['2304-6732']
DOI: https://doi.org/10.3390/photonics10040358